This chapter gives detailed data on examples of wet etching, popular wet etchants, temperature dependence of the etch rate, concentration dependence of the etch rate …
Wet etching consists of the use of an alkaline or acidic solution (the etchant) to chemically remove material from the surface of a sample. Etching has its origins in an artistic technique, developed in the fifteenth century, consisting of covering a metal surface—such as that of a knight''s armor—with a waxy material, removing part of the wax to create the desired …
The etching of Si(1 0 0) substrate exhibits a opposite relation between the etching direction and the [HF]/[H 2 O 2] ratio [11], in comparison with that of Si(1 1 1) substrate. In MACE of Si(1 0 0) wafer, a low [HF]/[H 2 O 2] ratio results in etching along 〈1 0 0〉 directions, because Si atoms to be removed are the least on (1 0 0) plane, while increasing [HF]/[H 2 O 2] allows …
The etching process is enabled by the high corrosivity of molten hydroxide that spontaneously reacts with SiNx, SiO2, Al2O3and Al at the surface of Si wafers through the top-down direction, thereby directly separating Ag from Si wafers. The etching process takes only 180s to recover >99.0% of Ag and >98.0% of Si from end-of-life Si solar panels.
The paper presents a review of silicon carbide etching—principles of the ICP-RIE method, the results of SiC etching and undesired phenomena of the ICP-RIE process are presented. The article ...
Surface texturing, either in combination with an anti-reflection coating or by itself, can also be used to minimize reflection. Any "roughening" of the surface reduces reflection by increasing the chances of reflected light bouncing back onto the surface, rather than out to the surrounding air.1
Based on environmental and energy problems, low-carbon economy has become a main direction for the future development. Nowadays, lithium-ion batteries (LIBs) are widely used in electric vehicles, but the energy density of batteries still cannot meet the requirements of battery life owing to the limited theoretical specific capacity of the commercial …
Typically, porous silicon structures are produced by electrochemical etching of silicon wafers in organic solutions of acetonitrile (CH 3 CN) or dimethylformamide (C 3 H 7 NO) containing hydrofluoric acid (HF) [31, …
Metal-assisted chemical etching (MacEtch) is one of the most scalable and cost-effective ways to form these surfaces, but researchers frequently encounter discrepancies between existing MacEtch ...
In the temperature range between 900 and 1000 °C, the boron film formation was considerable. In contrast, at 1100 °C, the silicon surface was etched at 0.36 μm min −1. At temperatures higher than 1050 °C, while etching occurred along with producing chlorosilanes, the silicon surface after the etching was still covered with boron. Boron ...
Finally, hydrofluoric acid was employed as an etching agent to selectively remove the silica components, leaving numerous pores on the carbon shell and space between the Si core and C shell. ... Chen T et al (2016) Binder-free lithium ion battery electrodes made of silicon and pyrolized lignin. RSC Adv 6(35):29308–29313. Article CAS Google ...
Herein, we design a hollow nitrogen-doped carbon-coated silicon (Si@Co-HNC) composite in a water-based system via a synergistic protecting-etching strategy of tannic acid. The prepared Si@Co-HNC …
The vast majority of reports are concerned with solving the problem of reduced light absorption in thin silicon solar cells 9,10,11,12,13,14,15,16,17,18,19,20,21,22,23,24, while very few works are ...
PDF | On Jun 6, 2024, Shuaibo Gao and others published Nature Sustainability (2024)：Recycling of silicon solar panels through a salt-etching approach..pdf | Find, read and cite all the research ...
Summary <p>There are two types of etching system, dry and wet etchings, are available for the thin‐film transistor (TFT) fabrication process. Dry etcher system is characterized by utilization of the low temperature plasma by glow discharge in the etching gas, and that plasma etches the target layer by ions and radicals from the plasma. This chapter discusses the …
The one technological solution for silicon etching is the Bosch process [25,26], but its use requires a special mask, passivation film, and silicon substrate preparation. The second solution is an isotropic plasma-chemical etching of silicon for the formation of high-density structures with silicon emission centers [27].
Production of high-aspect-ratio silicon (Si) nanowire-based anode for lithium ion batteries is challenging particularly in terms of controlling wire property and geometry to improve the battery ...
The pSi samples were prepared by R-MR of a silica precursor, commercial high silica zeolite Y (USY, CBV 780, SiO 2 /Al 2 O 3 = 80, Zeolyst International), in the system shown in Scheme 1 c. Zeolites were employed as silica precursors for porous silicon preparation [9, 29, 41, 42] a typical synthesis, zeolite Y (5.0 g) and sodium chloride (NaCl) (99%, Sigma …
An easy way for preparing high performance porous silicon powder by acid etching Al–Si alloy powder for lithium ion battery. Author links open overlay panel Zhiyu Jiang a, Chunli Li b, Shiji Hao b, Kai Zhu b, Ping Zhang b. Show more. Add to Mendeley. ... Silicon based lithium-ion battery anodes: A chronicle perspective review. 2017, Nano ...
Deep reactive ion etching (DRIE) technology is one of the most important technologies in the processing of microelectronic devices and microelectromechanical system. As a necessary process in semiconductor integration, it has been widely studied in the past decades. It is known that the traditional DRIE process typically uses a plasma etching reactor equipped …
Here we report a simple salt-etching approach to recycle Ag and Si from end-of-life Si solar panels without using toxic mineral acids and generating secondary pollution.
In this study, we employed two different chemical etching processes to recover Si wafers from degraded Si solar cells. Each etching process consisted of two steps: (1) first etching carried out using a nitric acid (HNO 3 ) and hydrofluoric acid …
Metal-assisted chemical etching (MacEtch) is one of the most scalable and cost-effective ways to form these surfaces, but researchers frequently encounter discrepancies between existing MacEtch ...
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